Nikon Optistation-5 Wafer Inspection System

Nikon Updated: 2007-06-20
Nikon Optistation-5 Wafer Inspection System

A cost-effective inspection unit featuring a small footprint and a full range of optical techniques.

The Optistation-V offers an ergonomic design and a user-friendly operating environment. This compact-size wafer inspection system also offers high accuracy and high throughput. The wide illuminator (WIL) and line illuminator (LIL) simplify visual macro inspections of unevenness, defocus, and other items that had been difficult to observe in conventional systems.

Highlights

• Small footprint and high throughput decreases cost of ownership.

• User friendly operating environment. The Optistation V incorporates the powerful and expandable DART software for the ultimate control of wafer inspection systems.

• Dual feeder arms and rotating triple arms are used in the transfer system to achieve high throughput.

• A clean transfer system suppresses contamination. SMIF is supported (available as an option).

• 200, 150, and φ125mm (8", 6", 5") wafers can be transferred and inspected. (φ100 mm support is available as an option.)

• Full range of optical techniques. Accommodates brightfield, darkfield, Nomarski DIC as well as confocal observation.

• Image archiving, GEM/SECSII, VARS option.

Wafer Size/type: 8, 6, 5 in. (200, 150, 125 mm) (SEMI/JEIDA standards) 4 in. (100 mm) (option)
Microscope (micro) observations : Total magnification - 20 to 3,000X; Observation modes - Brightfield, darkfield, Nomarski DIC, confocal (CF1, CF2); Illumination - Precentered lamphouse (12V-100W halogen lamp); High intensity lamps available as options. Power coherent illumination (150W metal halide light source, option)
Eyepiece tubes: Tilting trinocular eyepiece tube
Auto focus: LED illumination slit projection
Nosepieces: Motorized BD quintuple nosepiece (standard); Motorized DIC quintuple nosepiece (option)
Objectives: CF? objectives for CF Infinity Corrected optics, e.g. Epi Plan, Epi Plan Apo, BD Plan, BD Plan Apo series
Option: Confocal microscope unit
Macro observations (option): Rotation angle - 360° X/Y axes tilt - 0 to ?25, Backside observation (option); Macro illumination - Fiber illumination (halogen light source); Slit fiber and other options available
High precision stage: Stage travel (X-Y) 208 x 208 mm (8.2 in. x 8.2 in.) (observation area)
Observation points: Unlimited
Wafer transport: Number of elevators - 2, supports SMIF indexers (option); Elevator loading position - Front (standard); Transfer - Robotic handling by dual feeder arm and multi-rotary arm; vacuum chuck; non-contact pre-alignment; Functions - Sampling allocation.
Controller: Windows NT®
Communication with host computer: GEM/SECSII (option)
Dimensions (WxDxH), and weight (approx.): 1350 x 900 x 1446 mm (53.1 x 35.4 x 56.9 in.), 360 kg (790 lbs.); 995 x 1,000 x 1,200 mm (39.2 x 39.4 x 47.2 in.), 290 kg (639 lbs.) (Including vibration isolation table)
Vacuum rate: -800hPa (-600 mmHg) or less, flow rate 30 nl/min. or more
Power supply: 100 to 115V/220 to 240 AC ?10%, 15A max.
Operating temperature: 23° C (73° F) ±3° C (5.4° F)
Operating humidity: 50–20% RH