Nikon Optistation-7 Wafer Inspection System

Nikon Updated: 2007-06-20
Nikon Optistation-7 Wafer Inspection System

A clean, fast, accurate and reliable 300mm wafer inspection station.

Built to accept the latest technology in wafer transport, and incorporating its own integrated ULPA filtration system, the Optistation-7 easily exceeds new fab automation requirements. Nikon semiconductor inspection stations are designed to provide ultra-high precision and throughput, with exceptional accuracy and ease of use.

Highlights

• Dual feeder arm transfer unit offers high throughput

• Integrated mini-environment and non-contact wafer alignment provide for a class 1 wafer environment

• Macro illumination system allows for thin film observation and defocus detection as well as detection of particulates and scratches on both front and backside.

• High precision wafer alignment and DART defect review packages offer defect review capabilities for virtually all file formats

• Complies with all 300mm Fab requirements