Canon FPA-6000ES6a Wafer Imaging Scanner
Canon Updated: 2007-06-18The FPA-6000ES6a KrF Step-and-Scan system is a NA0.86, single-stage lithography tool designed for volume production of 300mm and 200mm wafers down to 90nm design rules
Features
The NA0.86 projection optics system developed through Canon's advanced lens design and measurement technology enables the ES6a to print down to 90nm.
The AFIS (Advanced Flexible Illuminator System) improves efficiency of special illumination, and its flexible mode-settings allows users to freely design their own illumination modes.
Its high throughput and high resolution enables ES6a to replace some of the ArF layers needed at 90nm production and even at 65nm production, reducing the total cost of ownership.
Semiconductor Specifications
Model type: KrF (248nm) Scanner
Wafer size: 300mm; 200mm
Resolution: =0.09µm
Numerical Aperture (NA): 0.55 ~ 0.86
Reticle size: 6in. (0.25in. thick)
Reduction ratio: 4:1
Field size: 26mm x 33mm
Overlay accuracy: ≤8nm (M+3)
Throughput: =100wph (300mm, 122shots); =170wph (200mm, 58shots)
There are no manuals currently available for this model.
Related Manuals
Canon FPA-5000ES4b Wafer Imaging Scanner
Canon FPA-5500iZa Wafer Imaging Stepper
Canon FPA-3000i5+ Wafer Imaging Stepper
Canon FPA-5500iX Wafer Imaging Stepper
Canon DR-1210C Universal Color Scanner
Canon DR-2050C Compact Color Scanner
Canon DR-2050SP Compact Color Scanner
Canon DR-2580C Compact Color Scanner
Canon DR-4010C Color Departmental Scanner
Canon DR-5010C Color Production Scanner
Canon DR-7080C Color Production Scanner
Canon DR-7580 Production Scanner