Canon FPA-6000ES6a Wafer Imaging Scanner

Canon Updated: 2007-06-18
Canon FPA-6000ES6a Wafer Imaging Scanner

The FPA-6000ES6a KrF Step-and-Scan system is a NA0.86, single-stage lithography tool designed for volume production of 300mm and 200mm wafers down to 90nm design rules

Features

The NA0.86 projection optics system developed through Canon's advanced lens design and measurement technology enables the ES6a to print down to 90nm.

The AFIS (Advanced Flexible Illuminator System) improves efficiency of special illumination, and its flexible mode-settings allows users to freely design their own illumination modes.

Its high throughput and high resolution enables ES6a to replace some of the ArF layers needed at 90nm production and even at 65nm production, reducing the total cost of ownership.

Semiconductor Specifications

Model type: KrF (248nm) Scanner
Wafer size: 300mm; 200mm
Resolution: =0.09µm
Numerical Aperture (NA): 0.55 ~ 0.86
Reticle size: 6in. (0.25in. thick)
Reduction ratio: 4:1
Field size: 26mm x 33mm
Overlay accuracy: ≤8nm (M+3)
Throughput: =100wph (300mm, 122shots); =170wph (200mm, 58shots)