Canon FPA-5500iZa Wafer Imaging Stepper

Canon Updated: 2007-06-18
Canon FPA-5500iZa Wafer Imaging Stepper

The FPA-5500iZa is a very high throughput i-line stepper that delivers significant CoO advantage when exposing layers down to 350nm, either stand-alone or mix-and-match with 200mm or 300mm KrF and ArF scanners

Features

The FPA-5500iZa achieved high overlay accuracy of 16nm through reticle magnification compensation and through improvements in Z and tilt compensation accuracy, stage environment control accuracy, and calibration accuracy.

With its 4.5kW high-pressured mercury lamp, faster-than-ever wafer stage and optimized wafer handling, the FPA-5500iZa delivers superior productivity at 155wph (200mm wafers) or 93wph (300mm wafers).

The FPA-500-iZa incorporates Canon's many generations of step-and-repeat know-how into an even-further refined - but still very cost effective - FPA-5000 platform.

Semiconductor Specifications

Model type: i-Line (365nm) Stepper
Wafer size: 300mm; 200mm
Resolution: ≤0.35µm
Numerical Aperture (NA): 0.45 ~ 0.57
Reticle size: 6in. (0.25in. thick)
Reduction ratio: 4:1
Field size: 26mm x 33mm
Overlay accuracy: ≤ 16nm (M+3)
Throughput: ≥93wph (300mm); ≥155wph (200mm)