Nikon NEXIV VMR-10080 CNC Video Measuring System

Nikon Updated: 2007-06-20
Nikon NEXIV VMR-10080 CNC Video Measuring System

Ultra-long stage stroke provides maximum performance in the measurement of large-size workpieces such as FPD devices.

Geared for ultra-wide measuring applications, the NEXIV VMR-10080 can handle large flat panels, shadow masks, etching sheets for lead frames, LCDs, mask patterns, and other large workpieces. Among its many features is a 1000 x 800 x 150 mm stage stroke, bright diascopic illumination, pinpoint laser autofocusing, and advanced search functions. An ultra-high magnification model is also available.

Type 1,2,3 Models

• Its 1000 x 800 mm stage travel is more than adequate to handle large flat panels, shadow masks, etching sheets for lead frames, LCDs, mask patterns, and other large work-pieces; 150mm Z-axis stroke; bright diascopic illumination.

• 3 models (type: 1, 2, 3) with 5 step zoom magnification to cover different fields of view and resolution requirements

• Laser AF also enables measurements of height variance and warping in workpieces

• Search function facilitates measurements of lands and holes of PCBs

• Variety of illumination choices facilitate accurate edge detection even for vague geometries

• High-speed stage and high-speed image processing provide high throughput

Z120X Model (with Maximum Magnification Module)
Achieves ultra-high magnification measurements with a long 1000 x 800 mm stage stroke. Ideal for measuring minute line widths of large-size display panels.

• Automatic measurements of batches of small parts

• Laser AF achieves high-accuracy measurements of bump heights

• Laser AF enables measurements of height variance and warping in workpieces

• Search function enables measurements of lands and holes of PCBs

• Search function also provides accurate measurements even when workpieces are not located properly on the stage

• Variety of illumination choices facilitate accurate edge detection even for weak edges

• High-speed stage and image processing provide higher throughput

• Ideal for LCD glass substrates (pattern measurements) and organic EL glass substrates (pattern measurements)

LU Model (universal epi-illuminator/motorized nosepiece)

• Full range of Nikon CFI60 LU microscope objectives from 5x to 150x

• Supports brightfield, darkfield, DIC, simple polarizing applications

•Motorized quintuple universal nosepiece

•Easy to use software controls all functions of the system